Paul Besser

Paul Besser

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1.
Gate Stack and Silicide Issues in Silicon Processing: Volume 61138 % NR
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Materials, Technology and Reliability for Advanced Interconnects 2005: Volume 8632 % NR
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Materials, Technology and Reliability for Advanced Interconnects 2005: Volume 8633 % NR
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Thin Films - Stresses and Mechanical Properties VIII: Volume 594NR
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Thin Films - Stresses and Mechanical Properties VIII: Volume 594NR
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