Chinmay K. Maiti

Chinmay K. Maiti

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1.
Stress and Strain Engineering at Nanoscale in Semiconductor Devices47 %
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Applications of Silicon-Germanium Heterostructure Devices47 %
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Binding:
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Release:
20 Jul 2001
Language:
English
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Stress and Strain Engineering at Nanoscale in Semiconductor DevicesNR
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Fabless Semiconductor Manufacturing1 % NR
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Binding:
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Release:
17 Nov 2022
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English
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5.
Introducing Technology Computer-Aided Design (TCAD)51 %
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